May 2021

Imec is using a high harmonic generation laser with anamorphic mirrors to explore high NA EUV challenges

Chipmakers look to EUV lithography’s next generation

Semiconductor manufacturers want the next big thing: to adopt high numerical aperture lithographic processes using extreme ultraviolet light to print smaller circuits. Andy Extance finds out more

 

It’s all in the data

Carlos Lee, Epic’s director general, talks with Ben Rubovitch, co-founder and CEO at DustPhotonics, a supplier of optical technology for silicon photonics

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