EUV Lithography

FEATURE

Mirror on semicon

To bring EUV lithography into mainstream semiconductor production will require more powerful sources, but there is also a lot of development work underway on the optics for the systems, as Katia Moskvitch discovers

FEATURE

Printing at the extreme

Immersion lithography has all but reached the limit of how small it can print features on silicon chips. Extreme UV lithography promises to be the answer, but there`s still a lot of work to be done before the technology is ready for commercial use, as Greg Blackman discovers