Energetiq’s Electrodeless Z-Pinch extreme ultraviolet (EUV) light sources emit light in the key 13.5nm region
An R&D facility has also been established at the headquarters of its parent company, Hamamatsu Photonics, in Japan
The technologies include two substrates of ultra-wide bandgap semiconductors, as well as electronic computer-aided design software for the development of complex integrated circuits. (Image: Shutterstock/sdecoret)
The technologies include two substrates of ultra-wide bandgap semiconductors, as well as electronic computer-aided design software for the development of complex integrated circuits
Imec is using a high harmonic generation laser with anamorphic mirrors to explore high NA EUV challenges
Semiconductor manufacturers want the next big thing: to adopt high numerical aperture lithographic processes using extreme ultraviolet light to print smaller circuits. Andy Extance finds out more
Emily Gallagher, imec, says we can all choose to apply our skills – in her case, within photomask-related semiconductor development – to help minimise the effects of climate change
Martin van den Brink has been awarded the Imec Lifetime of Innovation Award 2019
Imec is partnering with KMLabs to establish a real-time functional imaging and interference lithography laboratory, to enable imaging in resist on 300mm wafers down to an 8nm pitch
For water window imaging, HHG laser spectroscopy, x-ray plasma diagnostics, extreme ultraviolet lithography, optical characterisation, metrology and calibration, the McPherson Model 251MX high-energy flat-field spectrograph delivers uncompromising performance
Belgian research institute Imec and lithographic system manufacturer ASML have announced the joint establishment of a research lab to advance EUV lithography technology and advance semiconductor scaling towards the post-3nm logic node
Lithographic semiconductor processes using extreme ultraviolet light are set to enter mass production, writes Andy Extance, but must continue to improve
Matthew Dale reports from the European Photonic Industry Consortium’s Executive Meeting on Industrial Lasers, where it was explained how CO2 lasers could be used to produce the next generation of computer processors
Organoid imaged with Andor’s desktop confocal microscope system, the BC43. Credit: Andor
As microscopes become ever more powerful, a growing band of businesses are racing to make the latest technologies more accessible and more affordable, reports Rebecca Pool
Illustration of a three-dimensional crystal with various types of confining centres. (a) Crystal with four confining centres, each trapping waves (yellow) in all three dimensions simultaneously. (b) Crystal with a linear confining centre where waves can propagate in one dimension, analogous to an optical fibre. (c) Crystal with a planar confining centre where waves can propagate in two dimensions, analogous to a 2D electron gas. (Image: Vos et al.)
Newly discovered fundamental rules have been embedded into software to dramatically optimise the design of photonic integrated circuits
