Imec is using a high harmonic generation laser with anamorphic mirrors to explore high NA EUV challenges
Semiconductor manufacturers want the next big thing: to adopt high numerical aperture lithographic processes using extreme ultraviolet light to print smaller circuits. Andy Extance finds out more
Emily Gallagher, imec, says we can all choose to apply our skills – in her case, within photomask-related semiconductor development – to help minimise the effects of climate change
Martin van den Brink has been awarded the Imec Lifetime of Innovation Award 2019
Imec is partnering with KMLabs to establish a real-time functional imaging and interference lithography laboratory, to enable imaging in resist on 300mm wafers down to an 8nm pitch
For water window imaging, HHG laser spectroscopy, x-ray plasma diagnostics, extreme ultraviolet lithography, optical characterisation, metrology and calibration, the McPherson Model 251MX high-energy flat-field spectrograph delivers uncompromising performance
Belgian research institute Imec and lithographic system manufacturer ASML have announced the joint establishment of a research lab to advance EUV lithography technology and advance semiconductor scaling towards the post-3nm logic node
Lithographic semiconductor processes using extreme ultraviolet light are set to enter mass production, writes Andy Extance, but must continue to improve
Matthew Dale reports from the European Photonic Industry Consortium’s Executive Meeting on Industrial Lasers, where it was explained how CO2 lasers could be used to produce the next generation of computer processors
The semiconductor equipment provider ASML has received eight additional orders for EUV machines in Q2 2017, which the company says shows that the adoption for high-volume EUV manufacturing has reached an inflection point
ASML has acquired a 24.9 per cent minority stake of Germany-based Carl Zeiss SMT, a business group of Carl Zeiss AG (Zeiss), for €1 billion in cash. The main objective of this agreement is to facilitate the development of the future generation of extreme ultraviolet (EUV) lithography systems
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Tiny nanodiamonds are being used to dramatically optimise the calibration of optical microscopes, Matthew Dale finds
After the test disk is placed inside the chamber, some fine tuning is required to ensure they are horizontal and perfectly centred (credit: Caltech)
LIGO scientists have developed a new mirror coating that could dramatically increase the observatory's detection rate of gravitational waves
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Advances in research have made strides in the improvement of wearable and AR/VR displays
LLNL optical engineers Justin Wolfe (left) and Simon Cohen are seen through the 'r' filter (credit: Garry McLeod)
A telescope, described as one of the world’s newest, has been completed following a project undertaken by researchers to develop some very specialist optical filters
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Advances in optical prisms are being used to help researchers gain a greater understanding of space and astronomy
Universities offering associate degrees for optics technicians could help answer the photonics skills shortage, finds Jessica Rowbury
