Imec is partnering with KMLabs to establish a real-time functional imaging and interference lithography laboratory, to enable imaging in resist on 300mm wafers down to an 8nm pitch
For water window imaging, HHG laser spectroscopy, x-ray plasma diagnostics, extreme ultraviolet lithography, optical characterisation, metrology and calibration, the McPherson Model 251MX high-energy flat-field spectrograph delivers uncompromising performance
Belgian research institute Imec and lithographic system manufacturer ASML have announced the joint establishment of a research lab to advance EUV lithography technology and advance semiconductor scaling towards the post-3nm logic node
Lithographic semiconductor processes using extreme ultraviolet light are set to enter mass production, writes Andy Extance, but must continue to improve
Matthew Dale reports from the European Photonic Industry Consortium’s Executive Meeting on Industrial Lasers, where it was explained how CO2 lasers could be used to produce the next generation of computer processors
The semiconductor equipment provider ASML has received eight additional orders for EUV machines in Q2 2017, which the company says shows that the adoption for high-volume EUV manufacturing has reached an inflection point
ASML has acquired a 24.9 per cent minority stake of Germany-based Carl Zeiss SMT, a business group of Carl Zeiss AG (Zeiss), for €1 billion in cash. The main objective of this agreement is to facilitate the development of the future generation of extreme ultraviolet (EUV) lithography systems
Extreme ultraviolet lithography holds the potential for transforming semiconductor manufacturing. Gemma Church finds that commercial systems could be put into production within the next two years
Trumpf has invested €70 million in a new facility to house its laser technology for extreme ultraviolet (EUV) lithography
