Imec is using a high harmonic generation laser with anamorphic mirrors to explore high NA EUV challenges
Semiconductor manufacturers want the next big thing: to adopt high numerical aperture lithographic processes using extreme ultraviolet light to print smaller circuits. Andy Extance finds out more
Emily Gallagher, imec, says we can all choose to apply our skills – in her case, within photomask-related semiconductor development – to help minimise the effects of climate change
Martin van den Brink has been awarded the Imec Lifetime of Innovation Award 2019
Imec is partnering with KMLabs to establish a real-time functional imaging and interference lithography laboratory, to enable imaging in resist on 300mm wafers down to an 8nm pitch
For water window imaging, HHG laser spectroscopy, x-ray plasma diagnostics, extreme ultraviolet lithography, optical characterisation, metrology and calibration, the McPherson Model 251MX high-energy flat-field spectrograph delivers uncompromising performance
Belgian research institute Imec and lithographic system manufacturer ASML have announced the joint establishment of a research lab to advance EUV lithography technology and advance semiconductor scaling towards the post-3nm logic node
Lithographic semiconductor processes using extreme ultraviolet light are set to enter mass production, writes Andy Extance, but must continue to improve
Matthew Dale reports from the European Photonic Industry Consortium’s Executive Meeting on Industrial Lasers, where it was explained how CO2 lasers could be used to produce the next generation of computer processors
The semiconductor equipment provider ASML has received eight additional orders for EUV machines in Q2 2017, which the company says shows that the adoption for high-volume EUV manufacturing has reached an inflection point
ASML has acquired a 24.9 per cent minority stake of Germany-based Carl Zeiss SMT, a business group of Carl Zeiss AG (Zeiss), for €1 billion in cash. The main objective of this agreement is to facilitate the development of the future generation of extreme ultraviolet (EUV) lithography systems
Advances in optical metrology equipment are helping the semiconductor industry increase productivity and reduce downtime, finds Keely Portway
Andy Extance finds the pains and gains of laser light’s different behaviour in water for oceanographers using lidar
Carlos Lee, Epic’s director general, talks to Martina Mueller, CEO of 3D AG, a Swiss company specialising in micro and nanotechnology and holographic structures
David Giltner, founder of TurningScience, discusses whether these two seemingly different career paths can successfully overlap
Matthew Dale reports on the association’s yearly event, where the importance of diversity, photonics funding and investment were to the fore
Géraldine Andrieux, at Blumorpho, shares her top tips on getting investors’ attention as a startup
Scientists have developed a lensless, infrared spectral-imaging system for medical diagnostics
A metaform is a new optical component that can combine with freeform optics to enable compact AR/VR headsets and eyewear. (Image: University of Rochester illustration/Michael Osadciw)
Researchers have combined freeform optics and a metasurface to deliver high-quality AR/VR glasses that are compact and easy to wear
