EUV lithography

Model 251MX

For water window imaging, HHG laser spectroscopy, x-ray plasma diagnostics, extreme ultraviolet lithography, optical characterisation, metrology and calibration, the McPherson Model 251MX high-energy flat-field spectrograph delivers uncompromising performance

Driving Moore’s law with CO2 lasers

Matthew Dale reports from the European Photonic Industry Consortium’s Executive Meeting on Industrial Lasers, where it was explained how CO­2 lasers could be used to produce the next generation of computer processors

ASML invests €1 billion in Zeiss to boost EUV lithography

ASML has acquired a 24.9 per cent minority stake of Germany-based Carl Zeiss SMT, a business group of Carl Zeiss AG (Zeiss), for €1 billion in cash. The main objective of this agreement is to facilitate the development of the future generation of extreme ultraviolet (EUV) lithography systems

The future of EUV lithography

Extreme ultraviolet lithography holds the potential for transforming semiconductor manufacturing. Gemma Church finds that commercial systems could be put into production within the next two years

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