CLEO 2017
OSA, The Optical Society
Semiconductor manufacturers want the next big thing: to adopt high numerical aperture lithographic processes using extreme ultraviolet light to print smaller circuits. Andy Extance finds out more
Latest issue
Imec is using a high harmonic generation laser with anamorphic mirrors to explore high NA EUV challenges
University of Eastern Finland's Dr Mousumi Chakraborty discusses women's retention in STEM fields, comparing the differences between Europe and South Asia
Closer collaboration with application areas will be key to unlocking further photonics budget in Horizon Europe. Matthew Dale investigates
Carlos Lee, Epic’s director general, talks with Ben Rubovitch, co-founder and CEO at DustPhotonics, a supplier of optical technology for silicon photonics
