Imec to present high-NA extreme ultraviolet results at conference
The high-NA EUV lab is enabling the hub to produce learnings for the benefit of customers and future research (Image: ASML)
Imec will present information on advances in processes, masks and metrology that may enable the research hub to fully benefit from the resolution gain achieved with the first ASML 0.55NA EUV scanner.
Register for FREE to keep reading
Join 15,000+ photonics professionals staying ahead with:
- Exclusive insights, funding alerts & market trends
- Curated newsletters and digital editions
- Access to The Photonics100 list of R&D champions
- Exclusive panels & roundtables for professional development
- Technical White Papers & product updates to guide smarter decisions
Sign up now
Already a member? Log in here
Your data is protected under our privacy policy.
