Two-photon lithography ideal for PIC manufacturing, research suggests | Electro Optics

Two-photon lithography ideal for PIC manufacturing, research suggests

PICs

The method offers several advantages that can help to address the challenges of packaging PICs

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Ansys TSMC

TSMC looks to boost photonics integration with Ansys, Synopsys and Cadence partnerships

Ansys and TSMC will collaborate on a silicon photonics integration system and co-packaged optics platform. Synopsys will support Nvidia’s computational lithography platform, while Cadence will advance system and semiconductor design.

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