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Imec to present high-NA extreme ultraviolet results at conference
New process maps light inside integrated circuits, advancing design of photonic chips
Laser printer makes photonic chip fabrication more accessible
Focuslight completes purchase of Suss MicroOptics
Mass-producible, 10cm glass metalens captures space objects in high-res
MIT lithography simulator closes optical design-to-manufacturing gap
IBM, New York State invest $10bn in high-NA EUV lithography centre
Two-photon lithography ideal for PIC manufacturing, research suggests
New photoresist material improves EUV lithography patterning
ASML speeds up delivery of lithography machines to meet rising demand in China
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