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SPIE Optical Metrology will have solutions for design, modelling and inspection

The organisers of the SPIE Optical Metrology conference, which will take place alongside the Laser World of Photonics trade show in Munich, 23-26 May 2011, have announced that the conference will showcase new research in the optical measurement technologies enabling applications in industry, research modelling, inspection of nanostructures and artwork, and related topics. SPIE Optical Metrology aims to be the premier conference in Europe for scientists, engineers, researchers, and applications or product developers engaged in optical metrology, optical measurement systems, and optics for arts, architecture, and archaeology.

Technical sessions offer solutions to problems in industrial design and production engineering, optical technologies to preserve cultural heritage sites and artefacts, and optical principles of measurement and testing in the micro- and nanoscales.

A joint session on Measurements of Optical Components and Systems has been organised between the EOS conference on Testing for Fabrication and Assembly, a sub-conference of Manufacturing of Optical Components, and the SPIE conference on Optical Measurement Systems for Industrial Inspection. Papers will include invited talks by Gunther Notni (Fraunhofer-Institut für Angewandte Optik und Feinmechanik) on challenges in shape measurements of optical freeform surfaces, and by Michael Schulz (Physikalisch-Technische Bundesanstalt) on error influences in optical interferometry. The Optical Metrology conference plenary talk by Mitsuo Takeda (University of Electro-Communications) will cover coherence holography including new work in the spatial frequency comb for dispersion-free optical coherence tomography and profilometry.

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