EUV lithography reaches the starting line
3 September 2018
Lithographic semiconductor processes using extreme ultraviolet light are set to enter mass production, writes Andy Extance, but must continue to improve
Lithographic semiconductor processes using extreme ultraviolet light are set to enter mass production, writes Andy Extance, but must continue to improve
Veeco’s Spector-HT ion beam sputtering system for optical coating offers excellent layer thickness control, enhanced process stability and the lowest optical losses
Veeco’s Spector-HT Advanced Ion Beam Sputtering System will be on show, offering excellent layer thickness control, enhanced process stability and the lowest published optical losses in the industry.